JPH0256432U - - Google Patents
Info
- Publication number
- JPH0256432U JPH0256432U JP13489188U JP13489188U JPH0256432U JP H0256432 U JPH0256432 U JP H0256432U JP 13489188 U JP13489188 U JP 13489188U JP 13489188 U JP13489188 U JP 13489188U JP H0256432 U JPH0256432 U JP H0256432U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- chamber
- coil
- plasma chamber
- supplies
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008021 deposition Effects 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13489188U JPH0256432U (en]) | 1988-10-14 | 1988-10-14 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13489188U JPH0256432U (en]) | 1988-10-14 | 1988-10-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0256432U true JPH0256432U (en]) | 1990-04-24 |
Family
ID=31394047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13489188U Pending JPH0256432U (en]) | 1988-10-14 | 1988-10-14 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0256432U (en]) |
-
1988
- 1988-10-14 JP JP13489188U patent/JPH0256432U/ja active Pending